Diagram showing the results of a nine-hour gauge study, where 32,000 QE spectra were acquired at a measurement rate of one per second. First and last EQE spectra are shown, as are the 6-sigma error bars that were calculated from the entire data set.

Stand-alone, Mapping QE System optimized for flexibility and versatility

Integrated stage and control SW enables: Mapping of EQE at 40 sites/minute <1% beam uniformity EQE Configurable Chuck Design: Handles Multiple Sample Types Chuck can be Exchanged Flexible Options: Light Bias Specular Reflectance

Stand-alone or In-Line, Full-Cell Illumination QE System optimized for speed and ease of use.

In-Line Integration: Full-Cell QE measurements at the speed of the line Factory Interface communicates with Factory Host Stand-alone: Fast, Repeatable QE measurements Easy-to-Use, Recipe Driven SW Interface <7% beam uniformity

In-line, Multi-Head System enables simultaneous measurement of QE at select positions on cell.

Allows In-line acquisition of spatial QE data: Example: 21 wavelengths at 3 positions Example: 32 wavelengths at 2 positions Target QE to areas of concern: Example: Edge vs. Center Example: Deposition Uniformity Target QE data for wavelengths of concern: Example: Monitor Bandgap Example: Monitor CdS Deposition